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Poster Presentations
Day 1, June 22（Sun.）
Room P (Maesato East, Foyer, Ocean Wing)
- 1P-PM-21
Development of the Workflow for PFAS Analysis in Plating Films Using LC-MS/MS
(Shimadzu)
oKota Ishioka, Ryo Yamaguchi, Junichi Masuda
The use of per- and polyfluoroalkyl substances (PFAS) is restricted globally because they can be potentially toxic to animals and humans. On the other hand, chrome mist suppressants such as PFOS are sometimes used to prevent deterioration of the working environment due to hexavalent chromium in the plating solution.
In this study, the workflow using LC-MS/MS for analyzing PFAS in chromium plating film was developed. This study makes it possible to investigate whether PFAS contained in the plating solution is transferred into the plating film. The workflow for analysis for PFOA, PFOS and PFHxS in chromium plating films is follow. Chromium plating films were leached in hydrochloric acid solution. Then, they were neutralized with sodium hydroxide aqueous solution and purified by solid-phase extraction. The solution was analyzed by LC-MS/MS. The calibration curves range for these compounds were 0.2 to 5 ng/mL. The accuracy of the calibration points was within 90 to 100 %. As typical examples of obtained results among the analyses, the recoveries from chromium plating film were 99.8 % for PFOA, 84.2 % for PFOS, 93.6 % for PFHxS (spiked each as 25 ng/g), respectively.